Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Given a graph G with m edges and n nodes, a spanning tree T of G, and an edge e that is being deleted from or inserted into G, we give efficient O (n) algorithms to compute a possible swap for e that minimizes the diameter of the new spanning tree. This problem arises in high-speed networks, particularly in optical networks. © 1998 Springer-Verlag New York Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering