Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We have measured the temperature dependence of the electrical resistivity of UBe13 for magnetic fields up to 8 T and pressures to 95 kbar. Pressure increases the temperature range over which ρ{variant} = ρ{variant}0 + AT2, while the pressure and magnetic field dependences of ρ{variant}0 and A reflect changes in the quasiparticle interactions. © 1990.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
T. Schneider, E. Stoll
Physical Review B
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