Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
In this paper, we demonstrate the value of applying new microstructural metrics in the characterization of grain size variations associated with the effects of very low energy ion beam assisted deposition of nickel thin films. It is shown that the apparent changes in grain size are associated with specific texture components. It is suggested that these descriptions of grain growth during deposition may provide more meaningful interpretations of the atomistic level mechanisms influencing grain size changes associated with very low energy ion beam deposition of thin films.
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Sung Ho Kim, Oun-Ho Park, et al.
Small
Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules