Eric J. Fluhr, Joshua Friedrich, et al.
ISSCC 2014
As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask layout uniformity/evenness is highly desired, and it is usually measured by the feature density with defined feasible range in manufacture process design rules. To address the density control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/hours to a few minutes/seconds. And it is even faster than the existing approximate algorithms in literature. Copyright 2007 ACM.
Eric J. Fluhr, Joshua Friedrich, et al.
ISSCC 2014
Ruchir Puri, David S. Kung
VLSID/Embedded 2010
Ruchir Puri, Leon Stok, et al.
DAC 2003
Jim Kahle
ISPD 2007