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Journal of Materials Research
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Interface modifications for improving the adhesion of a-c:H films to metals

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Abstract

The adhesion of diamondlike hard carbon films to silicide forming metals was improved by using an interfacial silicon film several atomic layers thick. The use of thicker (> 10 nm) silicon layers results in a decrease in the adhesion, probably due to a degradation of the structural integrity by excessive silicide formation. © 1988, Materials Research Society. All rights reserved.

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Journal of Materials Research

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