Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We briefly review recent progress in elucidating the time-independent critical behavior of systems with infinite numbers of static absorbing states, and show that the critical exponent describing the decay with time of the order parameter right at the critical point is the same as that of the directed percolation problem.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Shu Tezuka
WSC 1991