Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
An energy analyser is described for measuring the energy of the secondary electrons in the scanning electron microscope. It consists of a 63°deflection cylindrical analyser followed by an electron collimator. This is simpler than a mirror design reported previously and gives a higher transmission factor and less defocusing of the electron beam of the microscope. This analyser has been applied to measure point-to-point variations in surface potential with an accuracy to ±1 V.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025
K.A. Chao
Physical Review B