Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
In this paper we discuss the properties of amorphous hydrogenated silicon and germanium films prepared by homogeneous chemical vapor deposition. Emphasis is placed upon the important differences between HOMOCVD and plasma-deposited films. Experiments and calculations are presented which illustrate the most important reactor dynamical parameters. © 1983.
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
Hiroshi Ito, Reinhold Schwalm
JES
E. Burstein
Ferroelectrics
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997