Patterning of highly conducting polyaniline films
T. Graham, A. Afzali, et al.
Microlithography 2000
A highly soluble conducting polyaniline derivative having conductivity in the hundreds of S/cm has been studied as a potential spin-applied electrode material for flat panel applications. It has been found that the polyaniline can be easily patterned using conventional photoresist technology which involves no harsh etchants as does the patterning of ITO. The optical transmission, sheet and contact resistance of the polyaniline film as well as the transmission versus voltage curve, charge retention, and image sticking properties of liquid crystal panels using polyaniline as an electrode are found to be comparable to those characteristic of ITO.
T. Graham, A. Afzali, et al.
Microlithography 2000
Alan Lien, C.-J. Chen
Japanese Journal of Applied Physics, Part 2: Letters
T. Graham, A. Afzali, et al.
Microlithography 2000
M.S. Lawliss, J.M. Rocque, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures