L. Clevenger, J.M.E. Harper, et al.
Journal of Applied Physics
Multilayer films of [Co 10 Å/Cu(t)]64 with copper thicknesses from t=10 to 29 Å annealed for 1 h at temperatures about 350°C showed a decrease in sample resistivity at 4.2 K. The giant magnetoresistance (GMR) maximums for as-deposited films at t=10 Å and t=23 Å shifted with annealing. The GMR decreased for t=10 Å and t=23 Å but increased for t=19 Å and t=29 Å indicating a complex behavior with annealing. Similarities with granular films are discussed.
L. Clevenger, J.M.E. Harper, et al.
Journal of Applied Physics
J.M.E. Harper, S. Motakef, et al.
Applied Physics Letters
C. Herring, R.M. Bozorth, et al.
Journal of Applied Physics
C. Cabral Jr., L. Clevenger, et al.
Journal of Materials Research