Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
This paper provides a detailed description of the IBM SiGe BiCMOS and rf CMOS technologies. The technologies provide high-performance SiGe heterojunction bipolar transistors (HBTs) combined with advanced CMOS technology and a variety of passive devices critical for realizing an integrated mixed-signal system-on-a-chip (SoC). The paper reviews the process development and integration methodology, presents the device characteristics, and shows how the development and device selection were geared toward usage in mixed-signal IC development.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Liqun Chen, Matthias Enzmann, et al.
FC 2005
Israel Cidon, Leonidas Georgiadis, et al.
IEEE/ACM Transactions on Networking
Chi-Leung Wong, Zehra Sura, et al.
I-SPAN 2002