Joseph M. Jasinski, Joan K. Frisoli, et al.
Faraday Discussions of the Chemical Society
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Joseph M. Jasinski, Joan K. Frisoli, et al.
Faraday Discussions of the Chemical Society
Joseph M. Jasinski, Jack O. Chu
The Journal of Chemical Physics
Joseph M. Jasinski
Chemical Physics Letters
Bernard S. Meyerson, Joseph M. Jasinski
Journal of Applied Physics