Ramya Viswanathan, Om Jaiswal, et al.
SPIE Advanced Lithography 2015
Forbidden pitches are the result of unwanted, non-linear effects that limit yield and not always well understood. Yet, as approximations, they are implicitly deployed through design rules. Many believe they result as a consequence of more complicated light sources. We develop an analytical model of aerial image quality as a function of light source. We show the effect is most pronounced for a point light source, the simplest of all. We develop a method to improve print image quality by illumination source optimization, and show promising first results. Additionally, it is shown how design rules capture forbidden pitches unsatisfactorily.
Ramya Viswanathan, Om Jaiswal, et al.
SPIE Advanced Lithography 2015
Hanjie Pan, Matthieu Simeoni, et al.
Astronomy and Astrophysics
Paul Hurley, Matthieu Simeoni
ICASSP 2016
Paul Hurley, Ted Hurley
ISIT 2007