Flash X‐ray microscopy with a gas jet plasma source

Abstract

A novel flash X‐ray source, the gas jet plasma source, has been used for contact X‐ray microscopy. Using a wavelength range of 2–7 nm a resolution of the order of 30 nm can be obtained. The gas jet plasma source provides a new and unique tool which should allow future imaging of wet live cells. 1984 Blackwell Science Ltd