Examination of uncoated photoresist by the low-loss electron method in the scanning electron microscope

Abstract

Earlier studies of photoresist by the low-loss electron method are extended in three ways. First, more work has been done on the imaging of fine details on the surface of a poorly conducting, low-density specimen. Second, the method has been applied to show the surface of a self-supported membrane. Finally, it has been found that the low-loss image (especially when used at low magnifications) can show the roughness of a flat surface.