J.W. Huang, D.F. Gaines, et al.
Journal of Electronic Materials
The reliability of molten KOH for revealing dislocations intersecting {100} faces of GaAs has been tested using transmission x-ray topography. It is found to be a "faithful" etch.
J.W. Huang, D.F. Gaines, et al.
Journal of Electronic Materials
C.C. Han, X.Z. Wang, et al.
Applied Physics Letters
P.G. McMullin, J.M. Blum, et al.
Applied Physics Letters
M.S. Goorsky, T.F. Kuech, et al.
JES