Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
We have investigated the role of surface oxygen on the rapid thermal nitridation of Si(001) by NH3 using medium energy ion scattering. For short times, typical of rapid thermal processing, monolayer quantities of oxygen are sufficient to reduce nitridation. The oxide remains on the surfaces after nitridation, which may adversely influence subsequent nitride chemical vapor deposition. © 1996 American Vacuum Society.
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997