Diffraction characteristics of photoresist surface-relief gratings

Abstract

Theoretical results from rigorous coupled-wave analysis are compared with experimental diffraction charac¬teristics for holographically formed dielectric photoresist surface-relief gratings with deep grooves (greater than a grating period) and high diffraction efficiency (>85%). The angular selectivity (at a fixed wave¬length) and the wavelength selectivity (at a fixed angle of incidence) are presented for both TE and TM inci¬dent polarizations. Modeling the gratings as a surface-relief modulated half-space and using rigorous cou¬pled-wave analysis are shown to produce good general agreement with the experimentally measured diffrac¬tion characteristics. © 1984 Optical Society of America.