Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
No abstract available.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991