Design and analysis of beam separator magnets for third generation aberration compensated PEEMs

Abstract

A state of the art X-ray photoemission electron microscope (PEEM2) is operational at the Advanced Light Source at a resolution of typically 50 nm for a range of chemical and magnetic surface studies. A new microscope, PEEM3, is under development with an aim of achieving a resolution of 5 nm and more than an order of magnitude increase in transmission at the nominal resolution of PEEM2. The resolution and flux improvement is realized by providing geometric and chromatic aberration compensations in the system using an electron mirror and a beam separator magnet. The nearly aberration-free design of the beam separator is critical to the performance of third generation PEEMs. In this paper, we present the optics design model, optimal operation parameters, analyses of aberration impact, as well as the mechanical alignment tolerance for PEEM3 separator prototypes. In particular, we emphasize the importance of a new semi-analytical approach to design complex charged particle optics using the truncated power series algebra. Because of its ability to compute high-order aberrations, this approach allows systematic and comprehensive analyses of any charged particle optics systems with analytical electric and magnetic fields. © 2003 Published by Elsevier B.V.