Sung Ho Kim, Oun-Ho Park, et al.
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Paper
Cyclic olefm resist polymers and polymerizations for improved etch resistance
Abstract
This paper will describe the strengths and unique challenges of building 193nm resists from acrylic polymers and cyclic olefin polymers. In particular, cyclic olefm (alternating) copolymer synthesis and properties will be discussed. ©1999TAPJ.
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