American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

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01 Sep 1997

Cross-linking of poly{1,1-diaryl(alkyl,aryl) 1-silacyclobutanes} under electron beam and deep UV irradiation

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Hysteresis in lithographic arrays of permalloy particles: Experiment and theory (invited)

J.F. Smyth, S. Schultz, et al.

Journal of Applied Physics

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Electron-beam microcolumns for lithography and related applications

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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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An MOS transistor with Schottky source/drain contacts and a self-aligned low-resistance T-gate

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Microelectronic Engineering

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A comparison of the E-beam and UV-sensitivities and relative O₂- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups

E. Babich, J.M. Shaw, et al.

Microelectronic Engineering

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