Critical plasma process issues in the fabrication of thin film transistor liquid crystal displays

Abstract

Plasma technology plays a key role in the mass production of thin film transistor (TFT) array. The technology directly affects the performance, reliability, and yield of the a-Si:H TFT array. In addition, the major advantage of plasma technology over other conventional thin film technology lies in the following three basic mass production requirements: low temperature, large area, and high throughput.