Conference paper
Impact of ultra thin oxide breakdown on circuits
James H. Stathis
ICICDT 2005
In spite of 50 years of history, there is still no consensus on the basic physics of Negative Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric, currently vie for dominance. The differences appear fundamental: one model holds that NBTI is a diffusion-limited process and the other holds that it is reaction-limited. Basic issues of disagreement are summarized and the main controversial aspects of each model are reviewed and contrasted.
James H. Stathis
ICICDT 2005
Miaomiao Wang, Richard G. Southwick, et al.
IRPS 2018
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IEDM 2017
Barry P. Linder, A. Dasgupta, et al.
IRPS 2016