Conference paper
Artifacts in aberration-corrected ADF-STEM imaging
Zhiheng Yu, Philip E. Batson, et al.
Ultramicroscopy
A method is described to find the optimal fourth order setup of a quadrupole-octupole third-order aberration corrector. Given accurate measurements of aberrations to fifth order, stimulus/response experiments can be used to synthesize pure controls for each measured aberration up to fourth order, including those which are caused by parasitic effects - symmetry violations, misalignments, construction mistakes, post-construction drift or other problems.
Zhiheng Yu, Philip E. Batson, et al.
Ultramicroscopy
Philip E. Batson
Micron
David A. Muller, Shanthi Subramanian, et al.
Physical Review Letters
Marek A. Turowski, Thomas F. Kelly, et al.
Journal of Applied Physics