Conference paper
Recent advances in MRAM technology
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005
The ability to electrically characterize submicron magnetic tunnel junctions (MTJ) using a conducting atomic force microscopy (CAFM) was discussed. The brief processing was found to save time and resources, and reduced the potential for damage to the MTJs. The sample requirements, CAFM processing route and the tip preparation were also elaborated.
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005
D.C. Worledge
Applied Physics Letters
Niladri N. Mojumder, David W. Abraham, et al.
IEEE Transactions on Magnetics
Koji Kita, David W. Abraham, et al.
Journal of Applied Physics