Comparison of the selective adsorption and reactivity behavior of WF ₆ and TaF₅ on SiO₂ and polyimide surfaces

Abstract

The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO 2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This trend is explained by differences in molecular structure and suggests a general basis for predicting selective deposition.