Conference paperTheoretical considerations about phase growth and phase formationF.M. D'HeurleMRS Fall Meeting 1995
PaperLowering the formation temperature of the C54-TiSi2 phase using a metallic interfacial layerC. Cabral Jr., L. Clevenger, et al.Journal of Materials Research
PaperCross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gateC.Y. Wong, F.S. Lai, et al.Journal of Applied Physics
PaperEffect of alloy additions on electromigration failures in thin aluminum filmsA. Gangulee, F.M. D'HeurleApplied Physics Letters