Conal E. Murray, Z. Ren, et al.
Applied Physics Letters
The (buried) interface between a polycrystalline Al thin-film feature and its substrate (single crystal Si) was characterized with x-ray microdiffraction. Using a focused x-ray beam (effective spot size on the specimen ∼2×12 μm) with the Si 004 reflection, topographic images of the Si around and under the metallization feature were constructed. Comparison with shear-lag model calculations indicate that the interface is not fully coupled despite the absence of surface cracks. © 1998 American Institute of Physics.
Conal E. Murray, Z. Ren, et al.
Applied Physics Letters
Qinghuang Lin, Shyng-Tsong Chen, et al.
Proceedings of SPIE - The International Society for Optical Engineering 2010
R.D. Goldblatt, B.N. Agarwala, et al.
IITC 2000
Wenwu Zhang, Y.Lawrence Yao, et al.
Journal of Manufacturing Science and Engineering