Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
The conductance of Si metal-oxide-semiconductor field-effect transistors (MOSFETs) of submicrometer dimensions has been studied as a function of source-drain voltage, gate voltage, and magnetic field. At liquid-helium temperatures, and for very small source-drain voltage VSD, the conductance was observed to exhibit so-called universal fluctuations. As VSD was increased, the conductance became increasingly nonlinear and asymmetric, with magnetic-field-dependent structure. This behavior was found to persist even when eVSDkBT. The data demonstrate that these reproducible deviations from Ohms law are caused by quantum-interference effects, as has been theoretically predicted for disordered metallic samples. © 1988 The American Physical Society.
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
E. Burstein
Ferroelectrics
H.D. Dulman, R.H. Pantell, et al.
Physical Review B