Conference paper
High performance and sub-ambient silicon microchannel cooling
E.G. Colgan, B.K. Furman, et al.
ICNMM 2006
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
E.G. Colgan, B.K. Furman, et al.
ICNMM 2006
J.T. Wetzel, M. Jost, et al.
Ultramicroscopy
J. Knickerbocker, P. Andry, et al.
ECTC 2006
E.G. Colgan, K.P. Rodbell
Journal of Applied Physics