J.M.E. Harper, K.P. Rodbell, et al.
Journal of Applied Physics
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
J.M.E. Harper, K.P. Rodbell, et al.
Journal of Applied Physics
E.G. Colgan, P.M. Alt, et al.
IBM J. Res. Dev
J. Wakil, E.G. Colgan, et al.
IMAPS 2008
C. Cai, Alan Lien, et al.
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers