E. Cartier, V. Narayanan, et al.
VLSI Technology 2004
It is well known that chemical etching of strontium titanate (SrTiO3) results in titanium-terminated (B site) surfaces. In this letter, we describe a facile method for generating strontium-terminated surfaces in SrTiO3. We demonstrate that a substrate treatment consisting of a low-power oxygen ashing followed by annealing yields a strontium (A site)-terminated surface in single-crystal SrTiO3 (100). This surface termination of the substrate allows the deposition of cuprate films with improved quality. © 2001 American Institute of Physics.
E. Cartier, V. Narayanan, et al.
VLSI Technology 2004
L. Krusin-Elbaum, C. Cabral, et al.
Applied Physics Letters
J. Misewich, A.G. Schrott
MRS Proceedings 2001
J.I. Dadap, J. Shan, et al.
Applied Physics B: Lasers and Optics