A simple metal pn polymer process using pulsed electron beams in soft vacuum

Abstract

We describe the proximity patterning using 28 kV, soft vacuum exposing electrons of silver, copper and gold containing metal-polymer composite films. The cross-linking of the metal doped polyamic acid, resulting in reduced solubility of exposed regions, leads to successful patterning following conventional wet development. The patterned films were found to contain the metal content redistributed, preferentially enriching the surface during the imidization cure, as supported by a variety of surface analysis methods. © 1988 SPIE.