Modeling UpLink power control with outage probabilities
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
We have developed a new silicon-containing resist for 193-nm immersion lithography. This resist is compatible with topcoats used in the industry today for immersion lithography. Most of the current topcoats contain 4-methyl-2- pentanol as a solvent. Our evaluations indicated that the previously developed silicon-containing resists are not compatible with the current topcoats because of their solubility in 4-methyl-2-pentanol. In the new resist polymers, we have incorporated high percentage (> 60 mol%) of lactone monomers to prevent them from dissolving in this solvent. In order to increase the lactone content in a silicon polymer, we have incorporated lactone containing acidlabile functionalities in addition to widely used acid-inert lactone monomers. Utilizing these polymers, we have demonstrated a functional silicon-containing photoresist for immersion lithography. © 2010 Copyright SPIE - The International Society for Optical Engineering.
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
Imran Nasim, Michael E. Henderson
Mathematics