T. Schneider, E. Stoll
Physical Review B
Dielectric breakdown (BD) of nFETs with TiN metal gates and HfO2/interfacial layer with 1.09 nm EOT is studied. Occurrence of progressive BD at low current levels is demonstrated. A new measurement methodology for extraction of the PBD time and its dependence on gate voltage are reported. © 2008 Elsevier Ltd. All rights reserved.
T. Schneider, E. Stoll
Physical Review B
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SPIE Advanced Lithography 2007
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Microelectronic Engineering
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Physical Review B