Conference paper
Polysilanes. Radiation sensitive materials for microlithography
R.D. Miller
ACS Division of Polymer Chemistry Washington DC Meeting 1990
No abstract available.
R.D. Miller
ACS Division of Polymer Chemistry Washington DC Meeting 1990
M. Brinkmann, V.Z.-H. Chan, et al.
Chemistry of Materials
J.F. Rabolt, D. Hofer, et al.
Macromolecules
Cattien Nguyen, R. Beyers, et al.
ACS Spring 1999