Conference paperEffect of annealing on the Cu distribution and Al2Cu precipitation in Al(Cu) thin filmsE.G. Colgan, K.P. Rodbell, et al.MRS Proceedings 1993
PaperPorosity in plasma enhanced chemical vapor deposited SiCoH dielectrics: A comparative studyA. Grill, V.V. Patel, et al.Journal of Applied Physics
Conference paperBlanket and local crystallographic texture determination in layered Al metallizationK.P. Rodbell, J.L. Hurd, et al.MRS Fall Meeting 1995
Conference paperEtching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmasJuliano Borges, Hongwen Yan, et al.SPIE Advanced Lithography 2024
