Silicon photonics and challenges for fabrication
N. Feilchenfeld, Karen Nummy, et al.
SPIE Advanced Lithography 2017
A competitive 300-mm silicon photonics foundry technology has been developed by GLOBALFOUNDRIES for general availability, which takes advantage of advanced CMOS process technology and provides a manufacturing scale. A state-of-the-art process design kit offers a codesign environment with access to a comprehensive photonics device library along with a monolithically integrated SOI CMOS device library. Advances in automated wafer-level optical test enable statistical photonic device characterization for development, photonic modeling, and manufacturing controls. The key challenges and solutions in developing a manufacturable photonic technology with state-of-the-art performance are described, as well as a roadmap for next generation high-performance monolithic silicon photonics are outlined.
N. Feilchenfeld, Karen Nummy, et al.
SPIE Advanced Lithography 2017
Bo Peng, Tymon Barwicz, et al.
OFC 2020
Bo Peng, Tymon Barwicz, et al.
FiO 2019
Benjamin G. Lee, Nicolas Dupuis, et al.
OFC 2018